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Microstructural and Corrosion Characteristics of Alloying Modified Layer on 5083 Al Alloy by Electrical Discharge Alloying Process with Pure Silicon Electrode

机译:作者:郝建军,王汝传,尹志民,稀有金

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摘要

This study examines the surface modification of 5083 Al alloy by electrical discharge alloying (EDA) process, using pure Si as anelectrode. Al alloy surface was modified by the EDA process to explore the effect of machining parameters (discharge current, pulse duration andduty factor) on the thickness, hardness and roughness of the alloyed layer. Samples were analyzed by scanning electron microscopy (SEM),electron probe analysis (EPMA) and X-ray diffraction. Since pure Si was used as an electrode, the alloyed layer had high concentration of Sifrom 2 mass% (the position in the layer at substrate side) to 12 mass% (the position in the layer close to surface side). Experimental results revealthat the thickness of the alloyed layer had a concave downward relationship with the discharge current and pulse duration. High hardness(� Hv 250) of the alloyed layer was obtained. The results of X-ray diffraction indicate that the primary phase in the substrate was �-Al, whilethere were composite phases containing �-Al and Si particles in the alloyed layer. Additionally, the alloyed layer exhibited as good corrosionresistance as 5083 Al alloy in aqueous NaCl.
机译:本研究使用纯硅作为电极,通过放电合金化(EDA)工艺检查了5083铝合金的表面改性。通过EDA工艺对铝合金表面进行了改性,以探索加工参数(放电电流,脉冲持续时间和占空比)对合金层厚度,硬度和粗糙度的影响。通过扫描电子显微镜(SEM),电子探针分析(EPMA)和X射线衍射分析样品。由于使用纯Si作为电极,因此合金层中的Si的浓度高,为2质量%(基板侧的层中的位置)〜12质量%(靠近表面侧的层中的位置)。实验结果表明,合金层的厚度与放电电流和脉冲持续时间呈凹向下关系。合金层硬度高(Hv 250)。 X射线衍射的结果表明,基体中的主要相是α-Al,而合金层中存在包含α-Al和Si颗粒的复合相。另外,该合金层在NaCl水溶液中表现出与5083铝合金一样好的耐腐蚀性。

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